Rapid Thermal Processing Furnace
RTP(Rapid Thermal Processing Furnace), rising speed rate up to 500℃/S. And at the end of the sintering process, the sample is taken out at high temperature directly, to achieve the fastest cooling in the physical state.
The chamber adopts a unique intake structure, The inner tube is gas inlet, the outer tube is gas outlet.This kind structure make reaction atmosphere exposed in the processing sample fully and Constantly.It is perfect helper for growing large-size two-dimensional graphene by CVD method.
Temperature measurement devices contact with the sample directly. it ensure the accuracy of the sample temperature.
Rapid Thermal Processing Furnace
Introduction:
RTP(Rapid Thermal Processing Furnace), rising speed rate up to 100℃/S. And at the end of the sintering process, the sample is taken out at high temperature directly, to achieve the fastest cooling in the physical state.
The chamber adopts a unique intake structure, The inner tube is gas inlet, the outer tube is gas outlet.This kind structure make reaction atmosphere exposed in the processing sample fully and Constantly.It is perfect helper for growing large-size two-dimensional graphene by CVD method.
Temperature measurement devices contact with the sample directly. it ensure the accuracy of the sample temperature.
Mian Applications:
- RTA(Rapid Thermal Annealing);
- Graphene and other vapor deposition, epitaxial growth of carbon nanotubes, etc.
- RTO; RTN;
- Silicidation;
- Diffusion;
- Implant Annealing;
- Contact Alloying;
- Crystallization and Densification.
Main Features:
1.Max speed of temperature rising is 100℃/S, max speed of temperature decreasing is 100℃/S.
2.Double layer tube structure, the sample exposes in the atmosphere much more Constantly.
3.Measure the temperature of the sample surface directly, more accuracy.
4.The chamber moves from one side to another side according to users’ preset, this will meet more lab applications;
5.Rich expansion interface, to meet the needs of various types of tests;
Technical Parameters:
| Model | HR1100-110IT-170 |
| Rated temperature | 1100C |
| Temperature range of stable state | 100-1000C |
| Uniform of heating zone | +/-2C |
| Process time of temperature state(S) | 2-100S(100-1000C) |
| Suggest temp rising speed | <= 100C/S |
| Max. Temperature decreasing speed | 1-200C/S( If nitrogen,much bigger speed) |
| Temperature control mode | Intelligent fuzzy closed-loop control
• PID automatic control and auto-tune function. •.Can store sintering programs to avoid the trouble caused by repeated settings of different experimental processes. |
| Operating system | Smart system
User Interface: English Process menu edit: Easy operation and graphical interface |
| Expansion port | Vacuum measurement and FFC gas supply |
| Watchdog | Turn off the main controller
When the system goes into an infinite loop |
| Thermocouple calibration state detection | Software calibration,easy and accurate,whether sensor status of the software analyzer is normal. |
| States detection of ultra high temperature | Cut off the main circuit when software detects abnormal high temperature |
| Max.power | 15KW |
| Rated voltage | AC380-400V,50HZ(60HZ customized) |
| Thermocouple | S type |
| Inner diameter of chamber reaction | 100x200mm |
| Available space of sample | 3.5” |
| Vacuum degree | 4.3×10-3Pa( with molecular pump) |
| Gas outlet size | KF16( Dia.8mm Pagoda mouth) |
| Gas inlet size | Dia.3.5mm double card sleeve |
| Warranty | 12 months |
| Certificate | CE, ISO9001 |
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